Name: Adrian Boland-Thoms

Date of Birth: 06-04-1960

Nationality: British

Marital Status: Married

Telephone No: 01206-872836 (Uni. Cleanroom), 01206-872831 (Uni. Office)

Address: No. 6 Cromwell Road, Colchester, Essex C02 7EN

Interests/ : Swimming, Bowling, Reading

Hobbies

O-levels: Art B, Economics C, English Language C, English Literature B, French C,

Geography C, German C and Mathematics B (1976)

A-levels: Chemistry E, English A, History E, Pure & Applied Mathematics C, and Physics B

(1978,81)

University of Essex, Chemistry degree course 1983 – 1985, 1987

C&G: Electronic Test & Repair 224 Pt I (distinction) (1989)

BSc Science (open): Chemistry, Physics, Electronics, Numerical Methods

and Mathematical Modelling 2.1 (1997)

I have fabricated semiconductor devices such as emitters, detectors, waveguides and hall-bars from semiconductor materials including GaAs, AlGaAs, InP, InGaAs, InGaAsP, and GaN for research groups at Essex, Queen Mary Westfield London, National Physical Laboratory, Ankara, and companies such as BT and IMCO.

Wirebonding at Essex and British Telecom

Wet chemical etching at Essex, RSRE (DERA) and Sheffield Central Facility

X-ray Laue backscattering analysis of semiconductor crystallography at Essex

Scanning Electron Microscopy at Essex for monitoring of processes including etch profiles

Transmission Electron Microscopy at Essex for investigation of contact metals

Thin Films: evaporated contact metals, spincoated dielectrics and photoresist

Thermal Annealing at Essex

Photolithography

COSHH maintenance of chemical storage, use and disposal

Fibre Optics: Ultra Bright HELLISH

Semiconductor laser mount design & construction

Hall measurements at Essex

Visual Basic (macros, data log & plot), C++, Visual C++ and HTML with some Java

OrCAD: Analogue and digital circuit design

WaveMaker: Photomask GDSII files, ftp to Rutherford, disks to Compugraphic

MS Office 2000: Data files, reports, statistical analysis: yields

Edwards 306 vacuum coating system

Kulicke & Soffa thermosonic-compression and ball wirebonders

(I installed the logic board in the 4123 bonder after it was rewired in the States; and checked the waveforms at various points in the circuits.)

Cambridge Instruments Scanning Electron Microscope S360

Jeol 200-CX transmission Electron Microscope

Tencor Alphastep 100 surface profiler

Type 576 Tektronix curve tracer

Tektronix 7704A sampling oscilloscope

(Used to monitor output from an Antares 76-s NdYAG)

Coherent autocorrelator FR103 used to monitor the pulse width of the output from a Coherent 700 dye laser

Essex science workshop: machining

Essex photographic: Printed circuit boards and low-resolution photomasks

Rutherford Appleton: Interdigitated coplanar waveguides. E-beam time at RAL

Glasgow: Coplanar waveguides on ion beam implanted GaAs

Supervision in the cleanroom of up to five groups of two or three final year undergraduate project students and up to ten or more postgraduates.

Managing the cleanroom budget for contract maintenance & repairs, consumables and wafer structures.

PIN diode

PAPERS

N. Balkan, A.O'Brien, A.Boland-Thoms, R. Potter, N. Poolton, M. Adams, J. Masum, A. Bek, A. Serpengüzel, A. Aydinli, and J. Roberts,

Proceedings of the Society of Photo-Optical Instrumentation Engineers Symposia: Optoelectronics and High Power Laser Applications, Physics and Simulation of Optoelectronic Devices VI, San Jose, California, USA 3283, 162-170 (1998).

A.Dyson, R.Sceats, N. Balkan, A.Boland-Thoms, M.J. Adams,

Field Dependent Emission form a HELLISH structure," 1999 Optical Society of America,

Prof. Mike Adams, University of Essex,

Dr Naci Balkan, University of Essex

I received training at RSRE Malvern (now DERA) in 1990.

I was first introduced to ion beam milling at this facility.

The electron-micrograph shows dry etch details on a 1mm hall bar.

 

X-ray

Laue back-scattering reveals

crystal symmetry in this semi-

insulating GaAs which I

processed at Essex.

At Essex I have used both SEM and TEM to photograph many of the devices I have fabricated there, including this plan view, shown above, of a p-i-n-i-p structure.

A detail from the same structure is shown below in an optical photograph taken at Sheffield University III-V central facility where I received further training and was introduced to RIE and silicon nitride CVD, as well as a range of spin-coated dielectrics